UV Direct Write Laser system Heidelberg Instruments DWL 66-fs (DWL)

CONTACT US

Guarantor: Peter Fecko
Technology / Methodology: Nanolitography infrastructure
Instrument status: Operational Operational, 14.4.2025 13:13
Equipment placement: CEITEC Nano - C1.29
Research group: CF: CEITEC Nano


Description:

Resist mask preparation for fabrication of nano and microstructures with ultimate dimensions below 50 nm. Includes resist spin coating facility, complete photolithography setup and electron beam lithography / shared by CEITEC users, open facilities


Publications:

  • Otýpka, M., 2024: Electric-current Control of Magnetic Textures in Synthetic Antiferromagnets. BACHELOR´S THESIS , p. 1 - 56; FULL TEXT
    (MAGNETRON, VERSALAB, DWL, WIRE-BONDER, KERR-MICROSCOPE)
  • GRYSZEL, M.; JAKEŠOVÁ, M.; VU, X.; INGEBRANDT, S.; GLOWACKI, E., 2024: Elevating Platinum to Volumetric Capacitance: High Surface Area Electrodes through Reactive Pt Sputtering. ADVANCED HEALTHCARE MATERIALS , doi: 10.1002/adhm.202302400; FULL TEXT
    (EVAPORATOR, DEKTAK, RIE-FLUORINE, DWL, SUSS-MA8)
  • NOWAKOWSKA, M.; JAKEŠOVÁ, M.; SCHMIDT, T.; OPANČAR, A.; POLZ, M.; REIMER, R.; FUCHS, J.; PATZ, S.; ZIESEL, D.; SCHERUEBEL, S.; KORNMUELLER, K.; RIENMÜLLER, T.; DEREK, V.; GLOWACKI, E.; SCHINDL, R.; ÜÇAL, M., 2024: Light-Controlled Electric Stimulation with Organic Electrolytic Photocapacitors Achieves Complex Neuronal Network Activation: Semi-Chronic Study in Cortical Cell Culture and Rat Model. ADVANCED HEALTHCARE MATERIALS 13(29), p. 1 - 19, doi: 10.1002/adhm.202401303; FULL TEXT
    (DWL, SUSS-MA8)
  • Hnilica, J., 2023: Current-induced domain wall propagation in ferrimagnetic wires. MASTER´S THESIS ; FULL TEXT
    (MAGNETRON, VERSALAB, RIGAKU9, SUSS-RCD8, DWL, WIRE-BONDER, KERR-MICROSCOPE)
  • Bevz, VM.; Mikhailov, MY.; Budinska, B.; Lamb-Camarena, S.; Shpilinska, SO.; Chumak, AV.; Urbanek, M.; Arndt, M.; Lang, W.; Dobrovolskiy, OV., 2023: Vortex Counting and Velocimetry for Slitted Superconducting Thin Strips. PHYSICAL REVIEW APPLIED 19(3), doi: 10.1103/PhysRevApplied.19.034098; FULL TEXT
    (DWL, LYRA, EVAPORATOR)

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