Ultra High Vacuum Preparation and Analytical System - Low Energy Electron Microscope SPECS FE-LEEM P90 (UHV-LEEM)

Description:

Low energy electron microscope (LEEM) is one of the instruments of the UHV-Cluster, which combines preparation and in-situ analysis by several complementary methods for the characterization of surfaces and thin films. The LEEM instrument utilizes low energy, elastically backscattered electrons to image surfaces with high spatial and temporal resolution. Advantages of LEEM over other surface imaging techniques are real-time imaging capability and existing several unique contrast mechanisms for image formation. LEEM is a powerful tool for studying the dynamic and static properties of surfaces and thin films, phase transitions, reactions, structure and morphology, and more.

Publications:

• PROCHÁZKA, P.; ČECHAL, J., 2024: ProLEED Studio: software for modeling low-energy electron diffraction patterns. JOURNAL OF APPLIED CRYSTALLOGRAPHY 57(1), p. 187 - 7, doi: 10.1107/S1600576723010312; FULL TEXT
  (UHV-LEEM, UHV-PREPARATION)
• JAKUB, Z.; TRLLOVÁ SHAHSAVAR, A.; PLANER, J.; HRŮZA, D.; HERICH, O.; PROCHÁZKA, P.; ČECHAL, J., 2024: How the Support Defines Properties of 2D Metal-Organic Frameworks: Fe-TCNQ on Graphene versus Au(111). JOURNAL OF THE AMERICAN CHEMICAL SOCIETY 146(5), p. 3471 - 12, doi: 10.1021/jacs.3c13212; FULL TEXT
  (UHV-DEPOSITION, UHV-LEEM, UHV-XPS, UHV-PREPARATION, UHV-SPM)
• KRAJŇÁK, T.; STARÁ, V.; PROCHÁZKA, P.; PLANER, J.; SKÁLA, T.; BLATNIK, M.; ČECHAL, J., 2024: Robust Dipolar Layers between Organic Semiconductors and Silver for Energy-Level Alignment. ACS APPLIED MATERIALS & INTERFACES 16(14), p. 18099 - 13, doi: 10.1021/acsami.3c18697; FULL TEXT
  (UHV-LEEM, UHV-XPS, UHV-PREPARATION, UHV-SPM, UHV-DEPOSITION)
• David, J., 2023: Preparation of elementary 2D materials and heterostructures. MASTER´S THESIS , p. 1 - 69; FULL TEXT
  (UHV-DEPOSITION, UHV-PREPARATION, UHV-LEEM, UHV-XPS, UHV-SPM)
• Jeřábek, F., 2023: Microscopic and spectroscopic analysis of elementary 2D materials. BACHELOR´S THESIS , p. 1 - 42; FULL TEXT
  (UHV-DEPOSITION, UHV-PREPARATION, UHV-LEEM, UHV-SPM)

• Makoveev, A. O., 2023: Molecular self-assembly on surfaces: the role of coverage, surface orientation and kinetics. PH.D. THESIS , p. 1 - 169; FULL TEXT
  (UHV-DEPOSITION, UHV-LEEM, UHV-XPS, UHV-PREPARATION, UHV-SPM)
• PROCHÁZKA, P.; ČECHAL, J., 2023: Visualization of molecular stacking using low-energy electron microscopy. ULTRAMICROSCOPY 253, doi: 10.1016/j.ultramic.2023.113799; FULL TEXT
  (UHV-DEPOSITION, UHV-LEEM, UHV-PREPARATION, UHV-SPM)
• Kurowská, A., 2023: 2D metal-organic frameworks from organic carbonitrile molecules on weakly interacting substrates. MASTER´S THESIS , p. 1 - 61; FULL TEXT
  (UHV-LEEM, UHV-MBE, UHV-PREPARATION, UHV-SPM, UHV-XPS)
• JAKUB, Z.; KUROWSKÁ, A.; HERICH, O.; ČERNÁ, L.; KORMOŠ, L.; SHAHSAVAR, A.; PROCHÁZKA, P.; ČECHAL, J., 2022: Remarkably stable metal-organic frameworks on an inert substrate: M-TCNQ on graphene (M = Ni, Fe, Mn). NANOSCALE 14(26), p. 9507 - 9, doi: 10.1039/d2nr02017c; FULL TEXT
  (UHV-DEPOSITION, UHV-LEEM, UHV-XPS, UHV-PREPARATION, UHV-SPM)
• MAKOVEEV, A.; PROCHÁZKA, P.; SHAHSAVAR, A.; KORMOŠ, L.; KRAJŇÁK, T.; STARÁ, V.; ČECHAL, J., 2022: Kinetic control of self-assembly using a low-energy electron beam. APPLIED SURFACE SCIENCE 600, p. 154106 - 7, doi: 10.1016/j.apsusc.2022.154106; FULL TEXT
  (UHV-DEPOSITION, UHV-LEEM, UHV-XPS, UHV-PREPARATION, UHV-SPM)
• STARÁ, V.; PROCHÁZKA, P.; PLANER, J.; SHAHSAVAR, A.; MAKOVEEV, A.; SKÁLA, T.; BLATNIK, M.; ČECHAL, J., 2022: Tunable Energy-Level Alignment in Multilayers of Carboxylic Acids on Silver. PHYSICAL REVIEW APPLIED 18(4), doi: 10.1103/PhysRevApplied.18.044048; FULL TEXT
  (UHV-DEPOSITION, UHV-PREPARATION, UHV-LEEM, UHV-SPM, UHV-XPS)
• MAKOVEEV, A.; PROCHÁZKA, P.; BLATNIK, M.; KORMOŠ, L.; SKÁLA, T.; ČECHAL, J., 2022: Role of Phase Stabilization and Surface Orientation in 4,4 ´-Biphenyl-Dicarboxylic Acid Self-Assembly and Transformation on Silver Substrates. JOURNAL OF PHYSICAL CHEMISTRY C (WEB) 126(23), p. 9989 - 9, doi: 10.1021/acs.jpcc.2c02538; FULL TEXT
  (UHV-PREPARATION, UHV-DEPOSITION, UHV-LEEM, UHV-SPM, UHV-XPS)
• PROCHÁZKA, P.; KORMOŠ, L.; SHAHSAVAR, A.; STARÁ, V.; MAKOVEEV, A.; SKÁLA, T.; BLATNIK, M.; ČECHAL, J., 2021: Phase transformations in a complete monolayer of 4,4 ´-biphenyl-dicarboxylic acid on Ag(001). APPLIED SURFACE SCIENCE 547, p. 149115- - 7, doi: 10.1016/j.apsusc.2021.149115; FULL TEXT
  (UHV-DEPOSITION, UHV-PREPARATION, UHV-SPM, UHV-XPS, UHV-LEEM)
• NAZZARI, D., GENZER, J., RITTER, V., BETHGE, O., BERTAGNOLLI, E., RAMER, G., LENDL, B., WATANABE, K., TANIGUCHI, T., RURALI, R., KOLÍBAL, M., LUGSTEIN, A., 2021: Highly Biaxially Strained Silicene on Au(111). JOURNAL OF PHYSICAL CHEMISTRY C (WEB) 125(18), p. 9973 - 8, doi: 10.1021/acs.jpcc.0c11033; FULL TEXT
  (UHV-LEEM, UHV-MBE, UHV-DEPOSITION)
• Kormoš, L., 2021: 2D molecular systems at surfaces. PH.D. THESIS , p. 1 - 140; FULL TEXT
  (UHV-DEPOSITION, UHV-PREPARATION, UHV-XPS, UHV-LEEM, UHV-SPM, EVAPORATOR)
• KORMOŠ, L.; PROCHÁZKA, P.; MAKOVEEV, A.; ČECHAL, J., 2020: Complex k-uniform tilings by a simple bitopic precursor self-assembled on Ag(001) surface. NATURE COMMUNICATIONS 11(1), p. 1 - 6, doi: 10.1038/s41467-020-15727-6; FULL TEXT
  (UHV-DEPOSITION, UHV-PREPARATION, UHV-LEEM, UHV-SPM, UHV-XPS)
• UHLÍŘ, V.; PRESSACCO, F.; ARREGI URIBEETXEBARRIA, J.; PROCHÁZKA, P.; PRŮŠA, S.; POTOČEK, M.; ŠIKOLA, T.; ČECHAL, J.; BENDOUNAN, A.; SIROTTI, F., 2020: Single-layer graphene on epitaxial FeRh thin films. APPLIED SURFACE SCIENCE 514, p. 145923-1 - 7, doi: 10.1016/j.apsusc.2020.145923; FULL TEXT
  (MAGNETRON, VERSALAB, RIGAKU9, UHV-LEEM, UHV-LEIS, UHV-SPM, UHV-PREPARATION, UHV-XPS, SIMS)
• PROCHÁZKA, P.; GOSALVEZ, M.; KORMOŠ, L.; DE LA TORRE, B.; GALLARDO, A.; ALBERDI-RODRIGUEZ, J.; CHUTORA, T.; MAKOVEEV, A.; SHAHSAVAR, A.; ARNAU, A.; JELÍNEK, P.; ČECHAL, J., 2020: Multiscale Analysis of Phase Transformations in Self-Assembled Layers of 4,4 ´-Biphenyl Dicarboxylic Acid on the Ag(001) Surface. ACS NANO 14(6), p. 7269 - 11, doi: 10.1021/acsnano.0c02491; FULL TEXT
  (UHV-LEEM, UHV-SPM, UHV-XPS, UHV-PREPARATION, UHV-DEPOSITION)
• FIKÁČEK, J.; PROCHÁZKA, P.; STETSOVYCH, V.; PRŮŠA, S.; VONDRÁČEK, M.; KORMOŠ, L.; SKÁLA, T.; VLAIC, P.; CAHA, O.; CARVA, K.; ČECHAL, J.; SPRINGHOLZ, G.; HONOLKA, J., 2020: Step-edge assisted large scale FeSe monolayer growth on epitaxial Bi(2)Se(3)thin films. NEW JOURNAL OF PHYSICS 22(7), p. 1 - 12, doi: 10.1088/1367-2630/ab9b59; FULL TEXT
  (UHV-LEEM, UHV-XPS, UHV-LEIS, UHV-DEPOSITION, UHV-PREPARATION)
• Tesař, J., 2020: Fabrication and characterization of atomically thin layers. MASTER´S THESIS , p. 1 - 67
  (WITEC-RAMAN, MPS150, UHV-LEEM, EVAPORATOR, RAITH, WIRE-BONDER, ICON-SPM)
• REDONDO, J.; LAZAR, P.; PROCHÁZKA, P.; PRŮŠA, S.; MALLADA, B.; CAHLÍK, A.; LACHNITT, J.; BERGER, J.; ŠMÍD, B.; KORMOŠ, L.; JELÍNEK, A.; ČECHAL, J.; ŠVEC, M., 2019: Identification of Two-Dimensional FeO2 Termination of Bulk Hematite α-Fe2O3(0001) Surface. JOURNAL OF PHYSICAL CHEMISTRY C (PRINT) 123(23), p. 14312 - 7, doi: 10.1021/acs.jpcc.9b00244; FULL TEXT
  (UHV-PREPARATION, UHV-LEEM, UHV-LEIS)
• Makoveev, A., 2018: Functional properties of 2D supramolecular nanoarchitectures. TREATISE TO STATE DOCTORAL EXAM , p. 1 - 32
  (UHV-LEEM, UHV-MBE, UHV-XPS, UHV-PREPARATION, UHV-SPM)
• KORMOŠ, L.; PROCHÁZKA, P.; ŠIKOLA, T.; ČECHAL, J., 2018: Molecular Passivation of Substrate Step Edges as Origin of Unusual Growth Behavior of 4,4´-Biphenyl Dicarboxylic Acid on Cu(001). JOURNAL OF PHYSICAL CHEMISTRY C (PRINT) 122(5), p. 2815 - 6, doi: 10.1021/acs.jpcc.7b11436; FULL TEXT
  (UHV-SPM, UHV-LEEM, UHV-PREPARATION)
• REDONDO, J.; TELYCHKO, M.; PROCHÁZKA, P.; KONEČNÝ, M.; BERGER, J.; VONDRÁČEK, M.; ČECHAL, J.; JELÍNEK, P.; ŠVEC, M., 2018: Simple device for the growth of micrometer-sized monocrystalline single-layer graphene on SiC(0001). JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A 36(3), p. 031401-1 - 6, doi: 10.1116/1.5008977; FULL TEXT
  (UHV-LEEM, TERS, ICON-SPM)

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