Scanning Probe Microscope Bruker Dimension Icon (ICON-SPM)

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Guarantor: Evelína Gablech, Ph.D.
Technology / Methodology: Probe microscopy & Nanomanipulation
Instrument status: Operational Operational, 14.3.2025 12:35
Equipment placement: CEITEC Nano - C1.22
Research group: CF: CEITEC Nano
Upcoming trainings: 27.3. 09:30 - 12:30: ICON-SPM basic training -


Description:

Dimension Icon incorporates the latest evolution of Bruker’s industry-leading nanoscale imaging and characterization technologies on a large sample tip-scanning AFM platform. It can be set up to perform major AFM modes such as Contact, Tapping, Noncontact, and additionally PeakForce in ScanAsyst imaging mode. In CEITEC Nano, we can perform advanced SPM modes such as Magnetic Force Microscopy, Piezoresponse Force Microscopy, Kelvin Probe Microscopy, Fast Tapping mode, and several other state-of-the-art techniques.


Publications:

  • Shestopalov, M.; Stará, V.; Rejhon, M.; Kunc, J., 2025: Annealing, design and long-term operation of graphite crucibles for the growth of epitaxial graphene on SiC. JOURNAL OF CRYSTAL GROWTH 651, doi: 10.1016/j.jcrysgro.2024.127988; FULL TEXT
    (WITEC-RAMAN, ICON-SPM)
  • MATTERN, M.; PUDELL, J.; ARREGI URIBEETXEBARRIA, J.; ZLÁMAL, J.; KALOUSEK, R.; UHLÍŘ, V.; RÖSSLE, M.; BARGHEER, M., 2024: Accelerating the Laser-Induced Phase Transition in Nanostructured FeRh via Plasmonic Absorption. ADVANCED FUNCTIONAL MATERIALS 34(32), doi: 10.1002/adfm.202313014; FULL TEXT
    (MAGNETRON, VERSALAB, RIGAKU9, ICON-SPM, WOOLLAM-VIS)
  • Hrdinová, S., 2024: Influence of the epitaxial strain at the lateral thin film-stripe interface on the Ferromagnetic-Antiferromagnetic phase coexistence in FeRh. BACHELOR´S THESIS , p. 1 - 49; FULL TEXT
    (MAGNETRON, VERSALAB, ICON-SPM)
  • Kiaba, M.; Suter, A.; Salman, Z.; Prokscha, T.; Chen, B.; Koster, G.; Dubroka, A., 2024: Observation of Mermin-Wagner behavior in LaFeO3/SrTiO3 superlattices. NATURE COMMUNICATIONS 15(1), doi: 10.1038/s41467-024-49518-0; FULL TEXT
    (ICON-SPM, RIGAKU9)
  • FAWAEER, S.; AL-QAISI, W.; SEDLÁKOVÁ, V.; TRUNEC, M.; SOBOLA, D.; MOUSA, M., 2024: Nanometer - Thick titanium film as a silicon migration barrier. MATERIALS TODAY COMMUNICATIONS 40, p. 1 - 17, doi: 10.1016/j.mtcomm.2024.109326; FULL TEXT
    (KRATOS-XPS, WITEC-RAMAN, ICON-SPM, EVAPORATOR)

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