Magnetron sputtering system BESTEC (MAGNETRON)

CONTACT US

Guarantor: Jan Prášek, Ph.D.
Technology / Methodology: Etching & Deposition
Instrument status: Operational Operational, 7.3.2025 16:35, Installed targets: Ta(1), Pt(2), Tb(3), Hf(4), FeRh(5), C(6), Co(7), Fe(8) + oxygen
Equipment placement: CEITEC Nano - C1.36
Research group: CF: CEITEC Nano


Description:

The UHV physical vapor deposition system for DC and RF thin-film sputtering deposition (mostly the metals) which utilizes strong electric and magnetic fields to increase the deposition yield. The eight sputtering target system has a reactive gas inlet for reactive deposition of oxides and nitrides as well. The substrate can be heated up to 800 °C.


Publications:

  • MATTERN, M.; JARECKI, J.; ARREGI URIBEETXEBARRIA, J.; UHLÍŘ, V.; RÖSSLE, M.; BARGHEER, M., 2024: Speed limits of the laser-induced phase transition in FeRh. APL MATERIALS 12(5), doi: 10.1063/5.0206095; FULL TEXT
    (MAGNETRON, VERSALAB, RIGAKU9)
  • Opršal, J., 2024: Fabrication and study of epitaxial NiO thin films and their antiferromagnetic domain structure. MASTER´S THESIS , p. 1 - 48; FULL TEXT
    (MAGNETRON, RIGAKU9, KERR-MICROSCOPE, ULTRAFAST-LASER)
  • Hrdinová, S., 2024: Influence of the epitaxial strain at the lateral thin film-stripe interface on the Ferromagnetic-Antiferromagnetic phase coexistence in FeRh. BACHELOR´S THESIS , p. 1 - 49; FULL TEXT
    (MAGNETRON, VERSALAB, ICON-SPM)
  • Otýpka, M., 2024: Electric-current Control of Magnetic Textures in Synthetic Antiferromagnets. BACHELOR´S THESIS , p. 1 - 56; FULL TEXT
    (MAGNETRON, VERSALAB, DWL, WIRE-BONDER, KERR-MICROSCOPE)
  • JAKEŠOVÁ, M.; KUNOVSKÝ, O.; GABLECH, I.; KHODAGHOLY, D.; GELINAS, J.; GLOWACKI, E., 2024: Coupling of photovoltaics with neurostimulation electrodes-optical to electrolytic transduction. JOURNAL OF NEURAL ENGINEERING 21(4), doi: 10.1088/1741-2552/ad593d; FULL TEXT
    (PARYLENE-SCS, MAGNETRON, SUSS-MA8, EVAPORATOR, RIE-FLUORINE, DIENER, WIRE-BONDER)

Show more publications...