Magnetron sputtering system BESTEC (MAGNETRON)

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Guarantor: Jan Prášek, Ph.D.
Technology / Methodology: Etching & Deposition
Instrument status: Operational Operational, 15.11.2024 11:31, Installed targets: Ta(1), Pt(2), Tb(3), SiO2(4), Co(5), V(6), Ti(7), Fe(8) + oxygen
Equipment placement: CEITEC Nano - C1.36
Research group: CF: CEITEC Nano


Description:

The UHV physical vapor deposition system for DC and RF thin-film sputtering deposition (mostly the metals) which utilizes strong electric and magnetic fields to increase the deposition yield. The eight sputtering target system has a reactive gas inlet for reactive deposition of oxides and nitrides as well. The substrate can be heated up to 800 °C.


Publications:

  • Castellano, A.; Alhada-Lahbabi, K.; Arregi, JA.; Uhlir, V.; Perrin, B.; Gourdon, C.; Fournier, D.; Verstraete, MJ.; Thevenard, L., 2024: Magnetic phase dependency of the thermal conductivity of FeRh from thermoreflectance experiments and numerical simulations. PHYSICAL REVIEW MATERIALS 8(8), doi: 10.1103/PhysRevMaterials.8.084411; FULL TEXT
    (MAGNETRON, VERSALAB, RIGAKU9, WOOLLAM-VIS)
  • OURDANI, D.; CASTELLANO, A.; VYTHELINGUM, A.; ARREGI URIBEETXEBARRIA, J.; UHLÍŘ, V.; PERRIN, B.; BELMEGUENAI, M.; ROUSSIGNÉ, Y.; GOURDON, C.; VERSTRAETE, M.; THEVENARD, L., 2024: Experimental determination of the temperature- and phase-dependent elastic constants of FeRh. PHYSICAL REVIEW B 110(1), doi: 10.1103/PhysRevB.110.014427; FULL TEXT
    (MAGNETRON, VERSALAB)
  • MATTERN, M.; PUDELL, J.; ARREGI URIBEETXEBARRIA, J.; ZLÁMAL, J.; KALOUSEK, R.; UHLÍŘ, V.; RÖSSLE, M.; BARGHEER, M., 2024: Accelerating the Laser-Induced Phase Transition in Nanostructured FeRh via Plasmonic Absorption. ADVANCED FUNCTIONAL MATERIALS 34(32), doi: 10.1002/adfm.202313014; FULL TEXT
    (MAGNETRON, VERSALAB, RIGAKU9, ICON-SPM, WOOLLAM-VIS)
  • MATTERN, M.; JARECKI, J.; ARREGI URIBEETXEBARRIA, J.; UHLÍŘ, V.; RÖSSLE, M.; BARGHEER, M., 2024: Speed limits of the laser-induced phase transition in FeRh. APL MATERIALS 12(5), doi: 10.1063/5.0206095; FULL TEXT
    (MAGNETRON, VERSALAB, RIGAKU9)
  • Opršal, J., 2024: Fabrication and study of epitaxial NiO thin films and their antiferromagnetic domain structure. MASTER´S THESIS , p. 1 - 48; FULL TEXT
    (MAGNETRON, RIGAKU9, KERR-MICROSCOPE, ULTRAFAST-LASER)

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