Ultra High Vacuum Preparation and Analytical System - Low Energy Ion Spectroscopy ION-TOF Qtac 100 (UHV-LEIS)

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Guarantor: Stanislav Průša, Ph.D.
Instrument status: Operational Operational, 14.9.2023 10:20
Equipment placement: CEITEC Nano - C1.38
Research group: CF: CEITEC Nano


Description:

The low-energy ion scattering spectroscope (LEIS) system is one of the instruments of the UHV-Cluster, which combines preparation and in-situ analysis by several complementary methods for the characterization of surfaces and thin films. The LEIS instrument provides the possibility of analysis of the elemental composition of a top-most surface layer via energy spectroscopy of back-scattered noble gas ions. Equipment: He, Ne, Ar ion sources, full azimuth acceptance analyzer for enhanced sensitivity, atomic oxygen source for sample cleaning, independent load-lock chamber.


Publications:

  • VANÍČKOVÁ, E.; PRŮŠA, S.; ŠIKOLA, T., 2024: Signal oscillations in helium scattering by bismuth atoms in the low energy range. NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIO 553, doi: 10.1016/j.nimb.2024.165385; FULL TEXT
    (UHV-MBE, UHV-LEIS, UHV-XPS)
  • PRŮŠA, S.; LINFORD, M.; VANÍČKOVÁ, E.; BÁBÍK, P.; PINDER, J. W:; ŠIKOLA, T.; BRONGERSMA, H., 2024: A practical guide to interpreting low energy ion scattering (LEIS) spectra. APPLIED SURFACE SCIENCE , doi: 10.1016/j.apsusc.2023.158793; FULL TEXT
    (UHV-LEIS)
  • AVVAL, T.; PRŮŠA, S.; ČECHAL, J.; CUSHMAN, C. V.; HODGES, G. T.; FEARN, S.; KIM, S. H.;ČECHAL, J.; VANÍČKOVÁ, E.; BÁBÍK, P.; ŠIKOLA, T.; BRONGERSMA, H. H.; LINFORD, M. R., 2023: A tag-and-count approach for quantifying surface silanol densities on fused silica based on atomic layer deposition and high-sensitivity low-energy ion scattering. APPLIED SURFACE SCIENCE 607, p. 154551 - 9, doi: 10.1016/j.apsusc.2022.154551; FULL TEXT
    (UHV-LEIS, UHV-XPS)
  • MOTYČKOVÁ, L.; ARREGI URIBEETXEBARRIA, J.; STAŇO, M.; PRŮŠA, S.; ČÁSTKOVÁ, K.; UHLÍŘ, V., 2023: Preserving Metamagnetism in Self-Assembled FeRh Nanomagnets. ACS APPLIED MATERIALS & INTERFACES 15(6), p. 8653 - 13, doi: 10.1021/acsami.2c20107; FULL TEXT
    (MAGNETRON, VERSALAB, RIGAKU9, UHV-LEIS, VERIOS, ICON-SPM)
  • Moeini, B.; Avval, TG.; Brongersma, HH.; Prusa, S.; Babik, P.; Vanickova, E.; Strohmeier, BR.; Bell, DS.; Eggett, D.; George, SM.; Linford, MR., 2023: Area-Selective Atomic Layer Deposition of ZnO on Si\SiO2 Modified with Tris(dimethylamino)methylsilane. MATERIALS 16(13), doi: 10.3390/ma16134688; FULL TEXT
    (UHV-LEIS)

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