Ultra High Vacuum Preparation and Analytical System - Low Energy Ion Spectroscopy ION-TOF Qtac 100 (UHV-LEIS)

Description:

The low-energy ion scattering spectroscope (LEIS) system is one of the instruments of the UHV-Cluster, which combines preparation and in-situ analysis by several complementary methods for the characterization of surfaces and thin films. The LEIS instrument provides the possibility of analysis of the elemental composition of a top-most surface layer via energy spectroscopy of back-scattered noble gas ions. Equipment: He, Ne, Ar ion sources, full azimuth acceptance analyzer for enhanced sensitivity, atomic oxygen source for sample cleaning, independent load-lock chamber.

Publications:

• VANÍČKOVÁ, E.; PRŮŠA, S.; ŠIKOLA, T., 2024: Signal oscillations in helium scattering by bismuth atoms in the low energy range. NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIO 553, doi: 10.1016/j.nimb.2024.165385; FULL TEXT
  (UHV-MBE, UHV-LEIS, UHV-XPS)
• PRŮŠA, S.; LINFORD, M.; VANÍČKOVÁ, E.; BÁBÍK, P.; PINDER, J. W:; ŠIKOLA, T.; BRONGERSMA, H., 2024: A practical guide to interpreting low energy ion scattering (LEIS) spectra. APPLIED SURFACE SCIENCE , doi: 10.1016/j.apsusc.2023.158793; FULL TEXT
  (UHV-LEIS)
• VANÍČKOVÁ, E.; PRŮŠA, S.; ŠIKOLA, T., 2023: Bismuth, by high-sensitivity low energy ion scattering. SURFACE SCIENCE SPECTRA 30(2), p. 1 - 15, doi: 10.1116/6.0002669; FULL TEXT
  (UHV-LEIS, UHV-PREPARATION)
• Moeini, B.; Pinder, JW.; Avval, TG.; Jacobsen, C.; Brongersma, HH.; Prusa, S.; Bábik, P.; Vanicková, E.; Argyle, MD.; Strohmeier, BR.; Jones, B.; Shollenberger, D.; Bell, DS.; Linford, MR., 2023: Controlling the surface silanol density in capillary columns and planar silicon via the self-limiting, gas-phase deposition of tris (dimethylamino) methylsilane, and quantification of surface silanols after silanization by low energy ion scattering. JOURNAL OF CHROMATOGRAPHY A 1707, doi: 10.1016/j.chroma.2023.464248; FULL TEXT
  (UHV-LEIS)
• AVVAL, T.; PRŮŠA, S.; ČECHAL, J.; CUSHMAN, C. V.; HODGES, G. T.; FEARN, S.; KIM, S. H.;ČECHAL, J.; VANÍČKOVÁ, E.; BÁBÍK, P.; ŠIKOLA, T.; BRONGERSMA, H. H.; LINFORD, M. R., 2023: A tag-and-count approach for quantifying surface silanol densities on fused silica based on atomic layer deposition and high-sensitivity low-energy ion scattering. APPLIED SURFACE SCIENCE 607, p. 154551 - 9, doi: 10.1016/j.apsusc.2022.154551; FULL TEXT
  (UHV-LEIS, UHV-XPS)

• MOTYČKOVÁ, L.; ARREGI URIBEETXEBARRIA, J.; STAŇO, M.; PRŮŠA, S.; ČÁSTKOVÁ, K.; UHLÍŘ, V., 2023: Preserving Metamagnetism in Self-Assembled FeRh Nanomagnets. ACS APPLIED MATERIALS & INTERFACES 15(6), p. 8653 - 13, doi: 10.1021/acsami.2c20107; FULL TEXT
  (MAGNETRON, VERSALAB, RIGAKU9, UHV-LEIS, VERIOS, ICON-SPM)
• Moeini, B.; Avval, TG.; Brongersma, HH.; Prusa, S.; Babik, P.; Vanickova, E.; Strohmeier, BR.; Bell, DS.; Eggett, D.; George, SM.; Linford, MR., 2023: Area-Selective Atomic Layer Deposition of ZnO on Si\SiO₂ Modified with Tris(dimethylamino)methylsilane. MATERIALS 16(13), doi: 10.3390/ma16134688; FULL TEXT
  (UHV-LEIS)
• Alcala, R.; DeLaRiva, A.; Peterson, E. J.; Benavidez, A.; Garcia-Vargas, C. E.; Jiang, D.; Pereira-Hernández, X. I.; Brongersma, H. H.; ter Veen, R.; Staněk, J.; Miller, J. T.; Wang, Y.; Datye, A., 2021: Atomically Dispersed Dopants for Stabilizing Ceria Surface Area. APPLIED CATALYSIS B: ENVIRONMENTAL 284, p. 1 - 9, doi: 10.1016/j.apcatb.2020.119722
  (UHV-LEIS)
• AVVAL, T. G.; PRŮŠA, S.; CHAPMAN, S. C.; LINFORD, M. R.; ŠIKOLA, T.; BRONGERSMA, H. H., 2021: Zinc and copper, by high sensitivity-low energy ion scattering. SURFACE SCIENCE SPECTRA 28(1), p. 1 - 8, doi: 10.1116/6.0000953; FULL TEXT
  (UHV-LEIS)
• UHLÍŘ, V.; PRESSACCO, F.; ARREGI URIBEETXEBARRIA, J.; PROCHÁZKA, P.; PRŮŠA, S.; POTOČEK, M.; ŠIKOLA, T.; ČECHAL, J.; BENDOUNAN, A.; SIROTTI, F., 2020: Single-layer graphene on epitaxial FeRh thin films. APPLIED SURFACE SCIENCE 514, p. 145923-1 - 7, doi: 10.1016/j.apsusc.2020.145923; FULL TEXT
  (MAGNETRON, VERSALAB, RIGAKU9, UHV-LEEM, UHV-LEIS, UHV-SPM, UHV-PREPARATION, UHV-XPS, SIMS)
• FIKÁČEK, J.; PROCHÁZKA, P.; STETSOVYCH, V.; PRŮŠA, S.; VONDRÁČEK, M.; KORMOŠ, L.; SKÁLA, T.; VLAIC, P.; CAHA, O.; CARVA, K.; ČECHAL, J.; SPRINGHOLZ, G.; HONOLKA, J., 2020: Step-edge assisted large scale FeSe monolayer growth on epitaxial Bi(2)Se(3)thin films. NEW JOURNAL OF PHYSICS 22(7), p. 1 - 12, doi: 10.1088/1367-2630/ab9b59; FULL TEXT
  (UHV-LEEM, UHV-XPS, UHV-LEIS, UHV-DEPOSITION, UHV-PREPARATION)
• PRŮŠA, S.; BÁBÍK, P.; MACH, J.; STRAPKO, T.; ŠIKOLA, T.; BRONGERSMA, H., 2020: Calcium and fluorine signals in HS-LEIS for CaF2(111) and powder-Quantification of atomic surface concentrations using LiF(001), Ca, and Cu references. SURFACE SCIENCE SPECTRA 27(2), p. 1 - 13, doi: 10.1116/6.0000325; FULL TEXT
  (UHV-LEIS)
• PRŮŠA, S.; BÁBÍK, P.; ŠIKOLA, T.; BRONGERSMA, H., 2020: Quantitative analysis of calcium and fluorine by high-sensitivity low-energy ion scattering: Calcium fluoride. SURFACE AND INTERFACE ANALYSIS , p. 1000 - 4, doi: 10.1002/sia.6889; FULL TEXT
  (UHV-LEIS)
• PRAJZLER, V.; PRŮŠA, S.; MACA, K., 2019: Rapid pressure-less sintering of fine grained zirconia ceramics: Explanation and elimination of a core-shell structure. JOURNAL OF THE EUROPEAN CERAMIC SOCIETY 39(16), p. 5309 - 11, doi: 10.1016/j.jeurceramsoc.2019.07.053; FULL TEXT
  (VERIOS, UHV-LEIS)
• Sekula, F., 2019: Surface contamination of optical elements studied by Low Energy Ion Scattering LEIS. BACHELOR´S THESIS ; FULL TEXT
  (UHV-LEIS)
• REDONDO, J.; LAZAR, P.; PROCHÁZKA, P.; PRŮŠA, S.; MALLADA, B.; CAHLÍK, A.; LACHNITT, J.; BERGER, J.; ŠMÍD, B.; KORMOŠ, L.; JELÍNEK, A.; ČECHAL, J.; ŠVEC, M., 2019: Identification of Two-Dimensional FeO2 Termination of Bulk Hematite α-Fe2O3(0001) Surface. JOURNAL OF PHYSICAL CHEMISTRY C (PRINT) 123(23), p. 14312 - 7, doi: 10.1021/acs.jpcc.9b00244; FULL TEXT
  (UHV-PREPARATION, UHV-LEEM, UHV-LEIS)
• Bábík, P., 2018: Charge exchange processes involved in projectile-target interaction at low energy range studied by HS-LEIS. MASTER´S THESIS , p. 1 - 55
  (UHV-LEIS)
• ŠIK, O.; BÁBOR, P.; POLČÁK, J.; BELAS, E.; MORAVEC, P.; GRMELA, L.; STANĚK, J., 2018: Low Energy Ion Scattering as a depth profiling tool for thin layers - Case of bromine Methanol etched CdTe. VACUUM 152, p. 138 - 7, doi: 10.1016/j.vacuum.2018.03.014; FULL TEXT
  (UHV-LEIS, KRATOS-XPS)
• Horký, M., 2016: Growth of Metastable FCC FE Thin Films on Cu(100)/Si(100) Substrates. MASTER´S THESIS , p. 1 - 96
  (UHV-PREPARATION, UHV-XPS, UHV-SPM, VERIOS, UHV-LEIS, KRATOS-XPS, RIGAKU3, LYRA, ICON-SPM)
• PRŮŠA, S.; PROCHÁZKA, P.; BÁBOR, P.; ŠIKOLA, T.; TER VEEN, R.; FARTMANN, M.; GREHL, T.; BRÜNER, P.; ROTH, D.; BAUER, P.; BRONGERSMA, H., 2015: Highly Sensitive Detection of Surface and Intercalated Impurities in Graphene by LEIS. LANGMUIR 31(35), p. 9628 - 8, doi: 10.1021/acs.langmuir.5b01935; FULL TEXT
  (UHV-LEIS)

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