Nanometer - Thick titanium film as a silicon migration barrier

MATERIALS TODAY COMMUNICATIONS

FAWAEER, S.; AL-QAISI, W.; SEDLÁKOVÁ, V.; TRUNEC, M.; SOBOLA, D.; MOUSA, M., 2024: Nanometer - Thick titanium film as a silicon migration barrier. MATERIALS TODAY COMMUNICATIONS 40, p. 1 - 17, doi: 10.1016/j.mtcomm.2024.109326; FULL TEXT
(KRATOS-XPS, WITEC-RAMAN, ICON-SPM, EVAPORATOR)

Equipment:

X-ray Photoelectron Spectroscopy Axis Supra
Witec Alpha 300R
Scanning Probe Microscope Bruker Dimension Icon
Electron beam evaporator BESTEC

Research Groups:

Advanced Ceramic Materials
CF: CEITEC Nano

CEITEC authors:

Prof. Martin Trunec
Dinara Sobola, Ph.D.
M.Sc. Saleh Hekmat Saleh Fawaeer
M.Sc. Wala´ Al-Qaisi