High temperature plasma enhanced chemical vapour deposition system on C-based materials Oxford Instruments Plasma Technology NanoFab (PECVD-NANOFAB)
CONTACT US
Guarantor:
Marek Eliáš, Ph.D.
Technology / Methodology:
Etching & Deposition
Instrument status:
Operational, 19.2.2024 13:47
Equipment placement:
CEITEC Nano - C1.34
Research group:
CF: CEITEC Nano
Description:
Chemical vapour deposition system going to very high deposition temperatures dedicated to the deposition of carbon nanomaterials, possibilities of plasma enhancement by discharges of different frequency (including their regular switching).
Publications:
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ROY, R.; NEČAS, D.; ZAJÍČKOVÁ, L., 2021: Evidence of flexoelectricity in graphene nanobubbles created by tip induced electric field. CARBON 179, p. 677 - 6, doi: 10.1016/j.carbon.2021.04.086; FULL TEXT
(PECVD-NANOFAB, WITEC-RAMAN, ICON-SPM) -
Polzer, A.; Sedlak, J.; Sedlacek, J.; Benes, L.; Mouralova, K., 2021: Vertical graphene growth on AlCu4Mg alloy by PECVD technique. COATINGS 11(9), doi: 10.3390/coatings11091108; FULL TEXT
(PECVD-NANOFAB, TITAN, HELIOS, ICON-SPM) -
KAUSHIK, P.; ELIÁŠ, M.; PRÁŠEK, J.; MICHALIČKA, J.; ZAJÍČKOVÁ, L., 2021: Manipulating MWCNT/TiO2 heterostructure morphology at nanoscale and its implications to NO2 sensing properties. MATERIALS CHEMISTRY AND PHYSICS 271, p. 124901-1 - 11, doi: 10.1016/j.matchemphys.2021.124901; FULL TEXT
(EVAPORATOR, PECVD-NANOFAB, DIENER, ALD, RIGAKU9, VERIOS, TITAN) -
Michal, L., 2020: Synthesis and study of graphene materials. MASTER´S THESIS , p. 1 - 54; FULL TEXT
(PECVD-NANOFAB, WITEC-RAMAN, KRATOS-XPS) -
KAUSHIK, P.; ELIÁŠ, M.; MICHALIČKA, J.; HEGEMANN, D.; PYTLÍČEK, Z.; NEČAS, D.; ZAJÍČKOVÁ, L., 2019: Atomic layer deposition of titanium dioxide on multi-walled carbon nanotubes for ammonia gas sensing. SURFACE AND COATINGS TECHNOLOGY 370, p. 235 - 9, doi: 10.1016/j.surfcoat.2019.04.031; FULL TEXT
(ALD, EVAPORATOR, PECVD-NANOFAB, WOOLLAM-VIS, VERIOS, TITAN, KRATOS-XPS, RIGAKU3)